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机构 UNIV GRENOBLE ALPES（2）
作者 FERRAH D（2）

CF4/H-2 Plasma Cleaning of Graphene Regenerates Electronic Properties of the Pristine Material

ACS APPLIED NANO MATERIALS

FERRAH D, RENAULT O, MARINOV D, ARIASZAPATA J, CHEVALIER N, MARIOLLE D, ROUCHON D, OKUNO H, BOUCHIAT V, CUNGE G

Effective patterning and cleaning of graphene by plasma etching and block copolymer lithography for nanoribbon fabrication

JOURNAL OF VACUUM SCIENCE TECHNOLOGY A

ARIASZAPATA J, FERRAH D, MEHEDI HA, CUNGE G, ZELSMANN M