| 国家/地区 |
Germany(2)
|
| 关键词 | |
| 出版物 | |
| 出版时间 | |
| 机构 | MAX PLANCK I.(2) |
| 作者 |
ITO Y(2)
|
Chemical Vapor Deposition of N-Doped Graphene and Carbon Films: The Role of Precursors and Gas Phase
ACS NANO
ITO Y, CHRISTODOULOU C, NARDI MV, KOCH N, SACHDEV H, MULLEN K
JOURNAL OF THE AMERICAN CHEMICAL SOCIETY
ITO Y, CHRISTODOULOU C, NARDI MV, KOCH N, KLAUI M, SACHDEV H, MULLEN K
