国家/地区 Korea（25） Taiwan（2）
关键词 GRAPHENE（8） GRAPHENE OXIDE（4） SILICONE RUBBER（3）
FEWLAYER GRAPHENE（2） PIEZOELECTRIC ACTUA.（2） PROPERTIE（2）
SEEBECK COEFFICIENT（2） TRANSPARENT CONDUCT.（2） WORK FUNCTION（2）
出版物 ACS APPLIED MATERIA.（3） NANOTECHNOLOGY（3） RSC ADVANCES（3）
NANOSCALE（2） POLYMERS（2）
出版时间 2020（6） 2019（4） 2021（4） 2012（3） 2013（3） 2015（3） 2016（3） 2017（2） 2022（2）
机构 SEOUL NATL U.（6） INHA UNIV（3） YEUNGNAM UNI.（3） BROWN UNIV（2）
KONGJU NATL .（2） KOREA ADV IN.（2）
作者 LEE DJ（31）

Facile chemical tuning of thermoelectric power factor of graphene oxide

MATERIALS CHEMISTRY PHYSICS

MEHMOOD T, KIM JH, LEE DJ, DIZHUR S, ODESSEY R, HIRST ES, OSGOOD RM, SAYYAD MH, MUNAWAR MA, XU J

Highly luminescent polyethylene glycol-passivated graphene quantum dots for light emitting diodes

RSC ADVANCES

KIM HJ, LEE CK, SEO JG, HONG SJ, SONG G, LEE J, AHN C, LEE DJ, SONG SH

High-actuation displacement with high flexibility for silicone rubber and few layer graphene composites

SENSORS ACTUATORS APHYSICAL

KUMAR V, MONIKA, LEE DJ

Selective Atomic Layer Deposition of Metals on Graphene for Transparent Conducting Electrode Application

ACS APPLIED MATERIALS INTERFACES

KIM M, NABEYA S, HAN SM, KIM MS, LEE S, KIM HM, CHO SY, LEE DJ, KIM SH, KIM KB

Electrical properties of graphene/In2O3 bilayer with remarkable uniformity as transparent conducting electrode

NANOTECHNOLOGY

LEE S, KIM M, CHO SY, LEE DJ, KIM HM, KIM KB

ROLE OF LOW SURFACE AREA FEW LAYER GRAPHENE IN ENHANCING MECHANICAL PROPERTIES OF POLY (1,4-CIS-ISOPRENE) RUBBER NANOCOMPOSITES

RUBBER CHEMISTRY TECHNOLOGY

KUMAR V, ALAM N, LEE DJ, GIESE U

Hydrophobic Paper-Based SERS Sensor Using Gold Nanoparticles Arranged on Graphene Oxide Flakes

SENSORS

LEE DJ, KIM DY

Versatile and Tunable Electrical Properties of Doped Nonoxidized Graphene Using Alkali Metal Chlorides

ACS APPLIED MATERIALS INTERFACES

LEE CK, SEO JG, KIM HJ, HONG SJ, SONG G, AHN C, LEE DJ, SONG SH

A microstructuring route to enhanced thermoelectric efficiency of reduced graphene oxide films

MATERIALS RESEARCH EXPRESS

MEHMOOD T, KIM JH, LEE DJ, DIZHUR S, ODESSEY R, HIRST ES, OSGOOD RM, SAYYAD MH, MUNAWAR MA, XU J

Removal of photoresist residues and healing of defects on graphene using H-2 and CH4 plasma

APPLIED SURFACE SCIENCE

YUN H, LEE S, JUNG D, LEE G, PARK J, KWON OJ, LEE DJ, PARK CY