国家/地区 Germany（2）
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作者 LUKOSE R（2）

Reliable metal-graphene contact formation process flows in a CMOS-compatible environment

NANOSCALE ADVANCES

ELVIRETTI M, LISKER M, LUKOSE R, LUKOSIUS M, AKHTAR F, MAI A

Influence of plasma treatment on SiO2/Si and Si3N4/Si substrates for large-scale transfer of graphene

SCIENTIFIC REPORTS

LUKOSE R, LISKER M, AKHTAR F, FRASCHKE M, GRABOLLA T, MAI A, LUKOSIUS M