CHEMICAL COMMUNICATIONS

ZHAO RB, GENG Q, CHANG L, WEI PP, LUO YL, SHI XF, ASIRI AM, LU SY, WANG ZM, SUN XP

CHEMICAL COMMUNICATIONS

WU TW, LI XY, ZHU XJ, MOU SY, LUO YL, SHI XF, ASIRI AM, ZHANG YN, ZHENG BZ, ZHAO HT, SUN XP

JOURNAL OF MATERIALS CHEMISTRY A

XIE HT, GENG Q, ZHU XJ, LUO YL, CHANG L, NIU XB, SHI XF, ASIRI AM, GAO SY, WANG ZMM, SUN XP

SMALL

LI SS, ZHAO XB, FENG YZ, YANG LT, SHI XF, XU PD, ZHANG J, WANG P, WANG M, CHE RC

NANO RESEARCH

HUANG H, GONG F, WANG Y, WANG HB, WU XF, LU WB, ZHAO RB, CHEN HY, SHI XF, ASIRI AM, LI TS, LIU Q, SUN XP

CHEMNANOMAT

LIU LL, WANG L, LI QQ, YU XF, SHI XF, DING JJ, YOU WB, YANG LT, ZHANG YH, CHE RC

JOURNAL OF MATERIALS CHEMISTRY A

ZHANG XX, LIU Q, SHI XF, ASIRI AM, LUO YL, SUN XP, LI TS

CRYSTENGCOMM

SHI YG, WANG D, ZHANG JC, ZHANG P, SHI XF, HAO Y

CHEMICAL ENGINEERING JOURNAL

YUAN YJ, CHEN DQ, SHI XF, TU JR, HU B, YANG LX, YU ZT, ZOU ZG

MATERIALS MANUFACTURING PROCESSES

SHI YG, WANG D, ZHANG JC, ZHANG P, SHI XF, HAO Y