国家/地区 | Germany(3) Usa(2) |
关键词 | PHOTOELECTRON SPECT.(2) |
出版物 | |
出版时间 | |
机构 | MAX PLANCK I.(2) UNIV CALIF B.(2) |
作者 | VELASCOVELEZ JJ(5) |
ACS APPLIED MATERIALS INTERFACES
FALLING LJ, MOM RV, DIAZ LES, NAKHAIE S, STOTZ E, IVANOV D, HAVECKER M, LUNKENBEIN T, KNOPGERICKE A, SCHLOGL R, VELASCOVELEZ JJ
SURFACE SCIENCE
VELASCOVELEZ JJ, JONES TE, STREIBEL V, HAVECKER M, CHUANG CH, FREVEL L, PLODINEC M, CENTENO A, ZURUTUZA A, WANG R, ARRIGO R, MOM R, HOFMANN S, SCHLOGL R, KNOPGERICKE A
JOURNAL OF PHYSICAL CHEMISTRY C
VELASCOVELEZ JJ, WU CH, WANG BY, SUN Y, ZHANG Y, GUO JH, SALMERON M
JOURNAL OF THE ELECTROCHEMICAL SOCIETY
VELASCOVELEZ JJ, CHUANG CH, HAN HL, MARTINFERNANDEZ I, MARTINEZ C, PONG WF, SHEN YR, WANG F, ZHANG YG, GUO JH, SALMERON M
ANGEWANDTE CHEMIEINTERNATIONAL EDITION
VELASCOVELEZ JJ, PFEIFER V, HAVECKER M, WEATHERUP RS, ARRIGO R, CHUANG CH, STOTZ E, WEINBERG G, SALMERON M, SCHLOGL R, KNOPGERICKE A