CHEMICAL RECORD
TETSUKA H
ACS NANO
HSU AL, KOCH RJ, ONG MT, FANG WJ, HOFMANN M, KIM KK, SEYLLER T, DRESSELHAUS MS, REED EJ, KONG J, PALACIOS T
ACS NANO
ROENBECK MR, WEI XD, BEESE AM, NARAGHI M, FURMANCHUK A, PACI JT, SCHATZ GC, ESPINOSA HD
NANO LETTERS
SHIH CJ, WANG QH, JIN Z, PAULUS GLC, BLANKSCHTEIN D, JARILLOHERRERO P, STRANO MS
ADVANCED FUNCTIONAL MATERIALS
GHAZINEJAD M, KYLE JR, GUO SR, PLESKOT D, BAO DD, VULLEV VI, OZKAN M, OZKAN CS
ACS NANO
KIM JY, LEE JH, GROSSMAN JC
NANO LETTERS
HOPKINS PE, BARAKET M, BARNAT EV, BEECHEM TE, KEARNEY SP, DUDA JC, ROBINSON JT, WALTON SG
ACS NANO
SINITSKII A, KOSYNKIN DV, DIMIEV A, TOUR JM
Remarkable enhancement in failure stress and strain of penta-graphene via chemical functionalization
NANO RESEARCH
ZHANG YY, PEI QX, SHA ZD, ZHANG YW, GAO HJ
SURFACE COATINGS TECHNOLOGY
WALTON SG, FOLEY BM, HERNANDEZ SC, BORIS DR, BARAKET M, DUDA JC, ROBINSON JT, HOPKINS PE