国家/地区 China（3）
关键词 CONTACT RESISTANCE（3）
出版物 NANOTECHNOLOGY（2）
出版时间 2021（2）
机构
作者 PENG SA（3）

Depositing aluminum as sacrificial metal to reduce metal-graphene contact resistance

CHINESE PHYSICS B

MAO DC, JIN Z, WANG SQ, ZHANG DY, SHI JY, PENG SA, WANG XY

Reducing metal/graphene contact resistance via N, N-dimethylacetamide-assisted clean fabrication process

NANOTECHNOLOGY

ZHU CY, PENG SA, ZHANG XR, YAO Y, HUANG XN, YAN YP, ZHANG DY, SHI JY, JIN Z

Stable p-type chemical doping of graphene with reduced contact resistance by single-layer perfluorinated polymeric sulfonic acid

NANOTECHNOLOGY

ZHANG XR, YAO Y, PENG SA, ZHU CY, HUANG XN, YAN YP, ZHANG DY, SHI JY, JIN Z