国家/地区 Netherlands（2）
关键词 EXTREME ULTRAVIOLET LIGHT（2）
出版物 APPLIED SURFACE SCI.（2）
出版时间
机构 UNIV TWENTE（2）
作者 MUND BK（2）

Etching processes of transferred and non-transferred multi-layer graphene in the presence of extreme UV, H2O and H-2

APPLIED SURFACE SCIENCE

MUND BK, STURM JM, VAN DEN BELD WTE, LEE CJ, BIJKERK F

Aromatic structure degradation of single layer graphene on an amorphous silicon substrate in the presence of water, hydrogen and Extreme Ultraviolet light

APPLIED SURFACE SCIENCE

MUND BK, STURM JM, LEE CJ, BIJKERK F