国家/地区 China（2）
关键词 HIGHK DIELECTRIC（2）
出版物
出版时间
机构
作者

Collaborative Applying the Ultra-low-k Dielectric and the High-k Dielectric Materials for Performance Enhancement in Coupled Multilayer Graphene Nanoribbon Interconnects

IEEE JOURNAL OF THE ELECTRON DEVICES SOCIETY

XU P, PAN ZL

Fluorinated Graphene in Interface Engineering of Ge-Based Nanoelectronics

ADVANCED FUNCTIONAL MATERIALS

ZHENG XH, ZHANG M, SHI XH, WANG G, ZHENG L, YU YH, HUANG AP, CHU PK, GAO H, REN W, DI ZF, WANG X