国家/地区 China（3）
关键词 PECVD（3）
出版物
出版时间 2020（3）
机构
作者

Heater-Free and Substrate-Independent Growth of Vertically Standing Graphene Using A High-Flux Plasma-Enhanced Chemical Vapor Deposition

ADVANCED MATERIALS INTERFACES

WU ZH, ZHANG YS, SHEN YL, ZHANG W, SHAO GS

Evolution of morphology and defects of graphene with growth parameters by PECVD

MATERIALS RESEARCH EXPRESS

LUO AL, XU Y, ZHOU H, YUAN ZH, CAO B, WANG CH, XU K

Si substrates playing two opposing roles in the process of preparing graphene by PECVD

APPLIED SURFACE SCIENCE

ZHANG PB, JIANG XY, FANG XH, YANG LY, CHEN XY