JOURNAL OF CLEANER PRODUCTION

ZHAO HG, YANG J, LI Z, GENG YY, LI J, CHEN MM, LI RF, LI QN, ZHANG L

CHEMELECTROCHEM

ZHANG YJ, CHEN Z, YAO L, WANG X, FU QM, LIN ZD, WANG SG

APPLIED SURFACE SCIENCE

ZHAO HG, YANG J, LI Z, GENG YY, HE SH, CHEN MM, LI RF, LI QN, ZHANG L

CRYSTALS

HU PZ, HUANG BC, MIAO QD, WANG HJ, LIU L, TAI WY, LIU TH, LI Z, CHEN SW, QIAN LJ

JOURNAL OF ALLOYS COMPOUNDS

WU YH, ZHU XY, ZHAO WJ, WANG YJ, WANG CT, XUE QJ

MOLECULAR SIMULATION

YU TF, BAI LF, XU ZJ, YANG XN

ACS APPLIED MATERIALS INTERFACES

WEI N, PENG XS, XU ZP

SEPARATION PURIFICATION TECHNOLOGY

MA FY, LI Z, ZHAO HG, GENG YY, ZHOU W, LI QN, ZHANG L

ACS NANO

JIAO SP, XU ZP

2D MATERIALS

LIANG T, HE GY, WU X, REN JD, GUO HX, KONG YH, IWAI H, FUJITA D, GAO HJ, GUO HM, LIU YC, XU MS