国家/地区 China（2）
关键词 CONTACT RESISTANCE（2）
出版物
出版时间
机构
作者 WANG XY（2）

Achieving Low Contact Resistance by Engineering a Metal-Graphene Interface Simply with Optical Lithography

ACS APPLIED MATERIALS INTERFACES

KONG QH, WANG XY, XIA LS, WU CB, FENG ZX, WANG M, ZHAO J

Depositing aluminum as sacrificial metal to reduce metal-graphene contact resistance

CHINESE PHYSICS B

MAO DC, JIN Z, WANG SQ, ZHANG DY, SHI JY, PENG SA, WANG XY