国家/地区 Germany（2）
关键词
出版物
出版时间 2016（2）
机构
作者 WENGER C（2）

Perfluorodecyltrichlorosilane-based seed-layer for improved chemical vapour deposition of ultrathin hafnium dioxide films on graphene

SCIENTIFIC REPORTS

KITZMANN J, GORITZ A, FRASCHKE M, LUKOSIUS M, WENGER C, WOLFF A, LUPINA G

Plasma-enhanced chemical vapor deposition of amorphous Si on graphene

APPLIED PHYSICS LETTERS

LUPINA G, STROBEL C, DABROWSKI J, LIPPERT G, KITZMANN J, KRAUSE HM, WENGER C, LUKOSIUS M, WOLFF A, ALBERT M, BARTHA JW