CHEMISTRYAN ASIAN JOURNAL
KABE R, FENG XL, ADACHI C, MULLEN K
ACS NANO
NARITA A, VERZHBITSKIY IA, FREDERICKX W, MALI KS, JENSEN SA, HANSEN MR, BONN M, DE FEYTER S, CASIRAGHI C, FENG X, MULLEN K
NATURE NANOTECHNOLOGY
CAI JM, PIGNEDOLI CA, TALIRZ L, RUFFIEUX P, SODE H, LIANG LB, MEUNIER V, BERGER R, LI RJ, FENG XL, MULLEN K, FASEL R
ADVANCED MATERIALS
WU ZS, PARVEZ K, WINTER A, VIEKER H, LIU XJ, HAN S, TURCHANIN A, FENG XL, MULLEN K
ACS NANO
MULLEN K
NATIONAL SCIENCE REVIEW
WU ZS, FENG XL, CHENG HM
JOURNAL OF THE AMERICAN CHEMICAL SOCIETY
PARVEZ K, WU ZS, LI RJ, LIU XJ, GRAF R, FENG XL, MULLEN K
Chemical Vapor Deposition of N-Doped Graphene and Carbon Films: The Role of Precursors and Gas Phase
ACS NANO
ITO Y, CHRISTODOULOU C, NARDI MV, KOCH N, SACHDEV H, MULLEN K
NATURE COMMUNICATIONS
XU XF, PEREIRA LFC, WANG Y, WU J, ZHANG KW, ZHAO XM, BAE S, BUI CT, XIE RG, THONG JTL, HONG BH, LOH KP, DONADIO D, LI BW, OZYILMAZ B
ANGEWANDTE CHEMIEINTERNATIONAL EDITION
SCHLUTTER F, NISHIUCHI T, ENKELMANN V, MULLEN K