国家/地区 Korea（2）
关键词 ATOMIC LAYER DEPOSITION（2）
出版物
出版时间
机构
作者 CHUN SH（2）

Hydrophobic Surface Treatment and Interrupted Atomic Layer Deposition for Highly Resistive Al2O3 Films on Graphene

ACS APPLIED MATERIALS INTERFACES

JEON JH, JERNG SK, AKBAR K, CHUN SH

The role of oxygen defects engineering via passivation of the Al2O3 interfacial layer for the direct growth of a graphene-silicon Schottky junction solar cell

APPLIED MATERIALS TODAY

KIM M, REHMAN MA, KANG KM, WANG Y, PARK S, LEE HS, ROY SB, CHUN SH, SINGH CA, JUN SC, PARK HH