国家/地区 Korea（3）
关键词
出版物 APPLIED PHYSICS LETTERS（3）
出版时间 2013（2）
机构 SUNGKYUNKWAN.（2）
作者 JU S（3）

Direct deposition of aluminum oxide gate dielectric on graphene channel using nitrogen plasma treatment

APPLIED PHYSICS LETTERS

LIM T, KIM D, JU S

Homogeneous and stable p-type doping of graphene by MeV electron beam-stimulated hybridization with ZnO thin films

APPLIED PHYSICS LETTERS

SONG W, KIM Y, KIM SH, KIM SY, CHA MJ, SONG I, JUNG DS, JEON C, LIM T, LEE S, JU S, CHOI WC, JUNG MW, AN KS, PARK CY

Horizontally aligned ZnO nanowire transistors using patterned graphene thin films

APPLIED PHYSICS LETTERS

KIM H, PARK JH, SUH M, AHN JR, JU S