国家/地区 Taiwan（3）
关键词
出版物
出版时间 2019（2）
机构 ACAD SINICA（3）
作者 HOFMANN M（3）

Ink-jet patterning of graphene by cap assisted barrier-guided CVD

RSC ADVANCES

CHEN DR, CHIU SK, WU MP, HSU CC, TING CC, HOFMANN M, HSIEH YP

Heavy Mediator at Quantum Dot/Graphene Heterojunction for Efficient Charge Carrier Transfer: Alternative Approach for High-Performance Optoelectronic Devices

ACS APPLIED MATERIALS INTERFACES

GHOSH R, YADAV K, KATARIA M, LIN HI, INBARAJ CRP, LIAO YM, NGUYEN Y, LU CH, HOFMANN M, SANKAR R, SHIH WH, HSIEH YP, CHEN YF

Work Function Engineering of Graphene Electrode via Chemical Doping

ACS NANO

SHI YM, KIM KK, REINA A, HOFMANN M, LI LJ, KONG J