国家/地区 |
Taiwan(3)![]() |
关键词 | |
出版物 |
APPLIED PHYSICS LETTERS(3)![]() |
出版时间 |
2015(3)![]() |
机构 | |
作者 |
Hybrid stacking structure of electroplated copper onto graphene for future interconnect applications
APPLIED PHYSICS LETTERS
SU YW, WU CS, LIU CH, LIN HY, CHEN CD
APPLIED PHYSICS LETTERS
NGUYEN BS, LIN JF, PERNG DC
APPLIED PHYSICS LETTERS
SHU GJ, LIOU SC, KARNA S, SANKAR R, HAYASHI M, CHU MW, CHOU FC