国家/地区 Usa（4）
关键词 ATOMIC LAYER DEPOSITION（4）
出版物 APPLIED PHYSICS LET.（2）
出版时间 2012（2）
机构 UNIV TEXAS D.（3）
作者 COLOMBO L（4）

Scaling of HfO2 dielectric on CVD graphene

APPLIED SURFACE SCIENCE

MCDONNELL S, AZCATL A, MORDI G, FLORESCA C, PIRKLE A, COLOMBO L, KIM J, KIM M, WALLACE RM

Atomic Layer Deposition of Dielectrics on Graphene Using Reversibly Physisorbed Ozone

ACS NANO

JANDHYALA S, MORDI G, LEE B, LEE G, FLORESCA C, CHA PR, AHN J, WALLACE RM, CHABAL YJ, KIM MJ, COLOMBO L, CHO K, KIM J

Scaling of Al2O3 dielectric for graphene field-effect transistors

APPLIED PHYSICS LETTERS

FALLAHAZAD B, LEE K, LIAN G, KIM S, CORBET CM, FERRER DA, COLOMBO L, TUTUC E

Characteristics of high-k Al2O3 dielectric using ozone-based atomic layer deposition for dual-gated graphene devices

APPLIED PHYSICS LETTERS

LEE B, MORDI G, KIM MJ, CHABAL YJ, VOGEL EM, WALLACE RM, CHO KJ, COLOMBO L, KIM J