国家/地区 Usa（2）
关键词
出版物 APPLIED PHYSICS LETTERS（2）
出版时间
机构
作者 WALKER ARH（2）

Ultraviolet/ozone treatment to reduce metal-graphene contact resistance

APPLIED PHYSICS LETTERS

LI W, LIANG YR, YU DM, PENG LM, PERNSTICH KP, SHEN T, WALKER ARH, CHENG GJ, HACKER CA, RICHTER CA, LI QL, GUNDLACH DJ, LIANG XL

Determination of graphene work function and graphene-insulator-semiconductor band alignment by internal photoemission spectroscopy

APPLIED PHYSICS LETTERS

YAN RS, ZHANG Q, LI W, CALIZO I, SHEN T, RICHTER CA, WALKER ARH, LIANG XL, SEABAUGH A, JENA D, XING HG, GUNDLACH DJ, NGUYEN NV