CHEMPHYSCHEM

LIANG QZ, HSIE SA, WONG CP

CHEMISTRYAN ASIAN JOURNAL

WEI HX, LI YY, CHEN JP, ZENG Y, YANG GQ, LI Y

ELECTROCHIMICA ACTA

JANG HS, YUN JM, KIM DY, PARK DW, NA SI, KIM SS

ACS APPLIED MATERIALS INTERFACES

KAMINSKA I, BARRAS A, COFFINIER Y, LISOWSKI W, ROY S, NIEDZIOLKAJONSSON J, WOISEL P, LYSKAWA J, OPALLO M, SIRIWARDENA A, BOUKHERROUB R, SZUNERITS S

JOURNAL OF THE CHINESE CHEMICAL SOCIETY

KUO SL, LIU WR, WU HC

JOURNAL OF ALLOYS COMPOUNDS

SOLISFERNANDEZ P, ROZADA R, PAREDES JI, VILLARRODIL S, FERNANDEZMERINO MJ, GUARDIA L, MARTINEZALONSO A, TASCON JMD

CHEMICAL JOURNAL OF CHINESE UNIVERSITIESCHINESE

YANG XY, WANG XB, LI J, YANG J, WAN L, WANG JC

CHINESE JOURNAL OF CHEMICAL PHYSICS

GENG ZG, ZHANG GH, LIN Y, YU XX, REN WZ, WU YK, PAN N, WANG XP

NANO RESEARCH

XU SL, DONG JW, PAN LJ, QUE XF, ZHENG YD, SHI Y, WANG XR

APPLIED SURFACE SCIENCE

LIU SY, CHEN K, FU Y, YU SY, BAO ZH