国家/地区 | England(6) |
关键词 | GRAPHENE(4) CHEMICAL VAPOR DEPO.(3) |
出版物 | ACS NANO(2) |
出版时间 | 2012(6) |
机构 | UNIV CAMBRIDGE(6) |
作者 | HOFMANN S(6) |
ACS NANO
DLUBAK B, MARTIN MB, WEATHERUP RS, YANG H, DERANLOT C, BLUME R, SCHLOEGL R, FERT A, ANANE A, HOFMANN S, SENEOR P, ROBERTSON J
ACS NANO
WEATHERUP RS, DLUBAK B, HOFMANN S
JOURNAL OF PHYSICAL CHEMISTRY C
KIDAMBI PR, DUCATI C, DLUBAK B, GARDINER D, WEATHERUP RS, MARTIN MB, SENEOR P, COLES H, HOFMANN S
IEEE PHOTONICS JOURNAL
BADHWAR S, PUDDY R, KIDAMBI PR, SIBIK J, BREWER A, FREEMAN JR, BEERE HE, HOFMANN S, ZEITLER JA, RITCHIE DA
CHEMPHYSCHEM
WEATHERUP RS, BAYER BC, BLUME R, BAEHTZ C, KIDAMBI PR, FOUQUET M, WIRTH CT, SCHLOGL R, HOFMANN S
Substrate-assisted nucleation of ultra-thin dielectric layers on graphene by atomic layer deposition
APPLIED PHYSICS LETTERS
DLUBAK B, KIDAMBI PR, WEATHERUP RS, HOFMANN S, ROBERTSON J