PLASMA CHEMISTRY PLASMA PROCESSING
MOHANTA A, LANFANT B, LEPAROUX M
ACS NANO
MISHRA S, LOHR TG, PIGNEDOLI CA, LIU JZ, BERGER R, URGEL JI, MULLEN K, FENG XL, RUFFIEUX P, FASEL R
2D MATERIALS
KUCKI M, AENGENHEISTER L, DIENER L, RIPPL AV, VRANIC S, NEWMAN L, VAZQUEZ E, KOSTARELOS K, WICK P, BUERKITHURNHERR T
ACS NANO
DI GIOVANNANTONIO M, DENIZ O, URGEL JI, WIDMER R, DIENEL T, STOLZ S, SANCHEZSANCHEZ C, MUNTWILER M, DUMSLAFF T, BERGER R, NARITA A, FENG XL, MULLEN K, RUFFIEUX P, FASEL R
JOURNAL OF NANOBIOTECHNOLOGY
KUCKI M, DIENER L, BOHMER N, HIRSCH C, KRUG HF, PALERMO V, WICK P
NANO LETTERS
DENIZ O, SANCHEZSANCHEZ C, DUMSLAFF T, FENG XL, NARITA A, MULLEN K, KHARCHE N, MEUNIER V, FASEL R, RUFFIEUX P
NANO LETTERS
DIENEL T, KAWAI S, SODE H, FENG XL, MULLEN K, RUFFIEUX P, FASEL R, GRONING O