国家/地区 Japan（2）
关键词
出版物
出版时间 2018（2）
机构 OSAKA UNIV（2）
作者 HIRANO T（2）

Investigation of reaction sequence occurring in graphene-assisted chemical etching of Ge surfaces in water

MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING

LI SX, NAKADE K, HIRANO T, KAWAI K, ARIMA K

Chemical etching of a semiconductor surface assisted by single sheets of reduced graphene oxide

CARBON

HIRANO T, NAKADE K, LI SX, KAWAI K, ARIMA K