国家/地区 | Japan(3) |
关键词 | CHEMICAL VAPOR DEPOSITION(4) |
出版物 | ANGEWANDTE CHEMIEIN.(3) |
出版时间 | 2014(2) |
机构 | TOHOKU UNIV(4) |
作者 | FUJITA T(4) |
ANGEWANDTE CHEMIEINTERNATIONAL EDITION
CHEN LH, HAN JH, ITO Y, FUJITA T, HUANG G, HU KL, HIRATA A, WATANABE K, CHEN MW
ADVANCED MATERIALS
ITO Y, QIU HJ, FUJITA T, TANABE Y, TANIGAKI K, CHEN MW
ANGEWANDTE CHEMIEINTERNATIONAL EDITION
ITO Y, TANABE Y, QIU HJ, SUGAWARA K, HEGURI S, TU NH, HUYNH KK, FUJITA T, TAKAHASHI T, TANIGAKI K, CHEN MW
ANGEWANDTE CHEMIEINTERNATIONAL EDITION
ITO Y, CONG WT, FUJITA T, TANG Z, CHEN MW