国家/地区 Italy（2）
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机构 UNIV AQUILA（2）
作者 BISTI F（2）

Use of Optical Contrast To Estimate the Degree of Reduction of Graphene Oxide

JOURNAL OF PHYSICAL CHEMISTRY C

PERROZZI F, PREZIOSO S, DONARELLI M, BISTI F, DE MARCO P, SANTUCCI S, NARDONE M, TREOSSI E, PALERMO V, OTTAVIANO L

Large Area Extreme-UV Lithography of Graphene Oxide via Spatially Resolved Photoreduction

LANGMUIR

PREZIOSO S, PERROZZI M, DONARELLI M, BISTI F, SANTUCCI S, PALLADINO L, NARDONE M, TREOSSI E, PALERMO V, OTTAVIANO L