CHEMISTRY OF MATERIALS
BRAEUNINGERWEIMER P, BURTON OJ, ZELLER P, AMATI M, GREGORATTI L, WEATHERUP RS, HOFMANN S
APL MATERIALS
BRAEUNINGERWEIMER P, BURTON O, WEATHERUP RS, WANG RZ, DUDIN P, BRENNAN B, POLLARD AJ, BAYER BC, VEIGANGRADULESCU VP, MEYER JC, MURDOCH BJ, CUMPSON PJ, HOFMANN S
JOURNAL OF THE AMERICAN CHEMICAL SOCIETY
WEATHERUP RS, AMARA H, BLUME R, DLUBAK B, BAYER BC, DIARRA M, BAHRI M, CABREROVILATELA A, CANEVA S, KIDAMBI PR, MARTIN MB, DERANLOT C, SENEOR P, SCHLOEGL R, DUCASTELLE F, BICHARA C, HOFMANN S
NANO LETTERS
WEATHERUP RS, BAEHTZ C, DLUBAK B, BAYER BC, KIDAMBI PR, BLUME R, SCHLOEGL R, HOFMANN S
NANO LETTERS
KIDAMBI PR, BAYER BC, BLUME R, WANG ZJ, BAEHTZ C, WEATHERUP RS, WILLINGER MG, SCHLOEGL R, HOFMANN S
ACS NANO
DLUBAK B, MARTIN MB, WEATHERUP RS, YANG H, DERANLOT C, BLUME R, SCHLOEGL R, FERT A, ANANE A, HOFMANN S, SENEOR P, ROBERTSON J
ACS NANO
WEATHERUP RS, DLUBAK B, HOFMANN S
JOURNAL OF PHYSICAL CHEMISTRY C
KIDAMBI PR, DUCATI C, DLUBAK B, GARDINER D, WEATHERUP RS, MARTIN MB, SENEOR P, COLES H, HOFMANN S
CHEMPHYSCHEM
WEATHERUP RS, BAYER BC, BLUME R, BAEHTZ C, KIDAMBI PR, FOUQUET M, WIRTH CT, SCHLOGL R, HOFMANN S
Substrate-assisted nucleation of ultra-thin dielectric layers on graphene by atomic layer deposition
APPLIED PHYSICS LETTERS
DLUBAK B, KIDAMBI PR, WEATHERUP RS, HOFMANN S, ROBERTSON J