APPLIED PHYSICS LETTERS
KUMAR R, SESSION DW, TSUCHIKAWA R, HOMER M, PAAS H, WATANABE K, TANIGUCHI T, DESHPANDE VV
JOURNAL OF MANUFACTURING PROCESSES
REGMI A, SHIN D, KIM JH, CHOI S, CHANG JY
JOURNAL OF THE AMERICAN CHEMICAL SOCIETY
LONG BA, LAU CY, RODRIGUEZ DJ, TANG SA, ANDERSON SL
INTERNATIONAL JOURNAL OF MOLECULAR SCIENCES
XIAO HM, JENSEN PE, CHEN XJ
MATERIALS TODAY CHEMISTRY
MURALI A, LAN YP, SARSWAT PK, FREE ML
THEORETICAL CHEMISTRY ACCOUNTS
NGUYEN HT, TRUONG TN
PHYSICAL REVIEW B
AGARWAL M, MISHCHENKO EG
PHYSICAL REVIEW B
MALLA RK, RAIKH ME
SEMICONDUCTOR SCIENCE TECHNOLOGY
AREZOOMANDAN S, QUISPE HC, CHANANA A, GOPALAN P, BANERJI S, NAHATA A, SENSALERODRIGUEZ B
PHYSICAL REVIEW B
MALLA RK, RAIKH ME