国家/地区 | England(8) |
关键词 | |
出版物 | APPLIED PHYSICS LETTERS(8) |
出版时间 | 2015(2) |
机构 | UNIV CAMBRIDGE(8) |
作者 | HOFMANN S(8) |
APPLIED PHYSICS LETTERS
DI NUZZO D, MIZUTA R, NAKANISHI K, MARTIN MB, ARIA AI, WEATHERUP R, FRIEND RH, HOFMANN S, ALEXANDERWEBBER J
APPLIED PHYSICS LETTERS
WEI B, KINDNESS SJ, ALMOND NW, WALLIS R, WU Y, REN Y, SHI SC, BRAEUNINGERWEIMER P, HOFMANN S, BEERE HE, RITCHIE DA, DEGL LNNOCENTI R
APPLIED PHYSICS LETTERS
BADHWAR S, SIBIK J, KIDAMBI PR, BEERE HE, ZEITLER JA, HOFMANN S, RITCHIE DA
Substrate-assisted nucleation of ultra-thin dielectric layers on graphene by atomic layer deposition
APPLIED PHYSICS LETTERS
DLUBAK B, KIDAMBI PR, WEATHERUP RS, HOFMANN S, ROBERTSON J
APPLIED PHYSICS LETTERS
CEBO T, ARIA AI, DOLAN JA, WEATHERUP RS, NAKANISHI K, KIDAMBI PR, DIVITINI G, DUCATI C, STEINER U, HOFMANN S
APPLIED PHYSICS LETTERS
JESSOP DS, KINDNESS SJ, XIAO L, BRAEUNINGERWEIMER P, LIN H, REN Y, REN CX, HOFMANN S, ZEITLER JA, BEERE HE, RITCHIE DA, DEGL INNOCENTI R
APPLIED PHYSICS LETTERS
WALKER MI, BRAEUNINGERWEIMER P, WEATHERUP RS, HOFMANN S, KEYSER UF
APPLIED PHYSICS LETTERS
WALKER MI, WEATHERUP RS, BELL NAW, HOFMANN S, KEYSER UF