国家/地区 Germany（2）
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出版物 SCIENTIFIC REPORTS（2）
出版时间
机构
作者 LUKOSIUS M（2）

Perfluorodecyltrichlorosilane-based seed-layer for improved chemical vapour deposition of ultrathin hafnium dioxide films on graphene

SCIENTIFIC REPORTS

KITZMANN J, GORITZ A, FRASCHKE M, LUKOSIUS M, WENGER C, WOLFF A, LUPINA G

Influence of plasma treatment on SiO2/Si and Si3N4/Si substrates for large-scale transfer of graphene

SCIENTIFIC REPORTS

LUKOSE R, LISKER M, AKHTAR F, FRASCHKE M, GRABOLLA T, MAI A, LUKOSIUS M