国家/地区 中国（2）
IPC部 C（2）
IPC大类 C01（2）
IPC小类 C01B（2）
IPC C01B032/184（2）
发明人 XUE X（2）
公开年 2017（2）
申请年 2017（2）
专利权人

Preparation of high-sensitivity reticular graphene/elastomer strain sensor used for wear-resistant electronic device by preparing graphene oxide dispersion, soaking cotton wool bandage, drying, heating, and eliminating interface resistance.

CHEN Y, JIA H, QIAO X, WANG J, WEN Y, XUE X, YIN B, YIN Q, ZHANG X

Preparing network-shaped graphene nano material involves calcining carbon source organic material to obtain calcined material, adding water for washing, filtering to obtain filter residue, and annealing under protective atmosphere.

XUE X, HOU H, YAN X, XUE F, YANG B, WANG J, LIU H, CHEN J, LUO C, CAO H, KONG X, CHENG B, WANG Z