国家/地区 中国（3）
IPC部 F（3）
IPC大类 F27（3）
IPC小类 F27B（3）
IPC F27D099/00（3）
发明人
公开年 2021（2）
申请年
专利权人

Continuous graphene microwave reducing furnace for processing graphene, has vacuum pump whose top portion is movably connected with bottom of processing cylinder, and support that is provided at bottom of vacuum pump, whose bottom is in contact with bottom of vacuum pump.

HE M, ZHANG H

Bidirectional temperature control airtight sintering furnace, has cart provided with bracket for placing base, and quick dismounting devices for quickly sealing or separating sealing cover and base.

LI Y

Graphene ultra-high temperature resistant curing furnace comprises a bottom plate, where the top outer wall of the bottom plate is provided with a shell, and the top outer wall of the bottom plate is provided with a connecting groove.

ZHANG J