| 国家/地区 |
美国(3)
|
| IPC部 |
C(3)
|
| IPC大类 |
C09(3)
H01(3)
D01(2)
|
| IPC小类 |
C09D(3)
H01M(3)
D01D(2)
D01F(2) H01G(2) |
| IPC |
C09D005/44(3)
|
| 发明人 |
CHO K(2)
CHO Y(2)
KIM H(2)
PARK S(2) SHIN M(2) YEO C(2) |
| 公开年 | |
| 申请年 | |
| 专利权人 | AICT(2) PURITECH CO .(2) |
VISSER S J, WOODWORTH B E, GONDERJONES H, SCHNEIDER J R, MOORE K L, FOLLET M L, MA L, MUNRO C H, POLLUM M M, FRENCH M S, CONDIE A G, HARRISON A E, SCHWENDEMAN I G, DEI D K, BANCROFT C N, APANIUS C, SYLVESTER K T, DEDOMENIC C J, PUODZIUKYNAITE E, HOLLY G, AMII H, NOEL B C, CHRISTOPHER A, POLLUM J M M, GONDERJONES H A
PARK S, SHIN M, KIM H, YEO C, CHO Y, CHO K
