国家/地区 中国（7）
IPC部 C（7）
IPC大类 C25（7）
IPC小类 C25D（7）
IPC C25D003/46（7）
发明人 LIN R（7）
公开年 2022（7）
申请年 2021（4）  2022（3） 
专利权人 ZHEJIANG CHI.（7）

Composite dispersant useful for blocking or slowing agglomeration of graphene in dispersion liquid, comprises distilled water and 2-ethylhexyl sulfate sodium salt.

OTHER I R N, ZHENG J, LIN J, SHEN Q, WANG C, ZHOU J, XU Z, LIN R, ZENG L, HU Y

Compound type dispersant useful for mixed electroplating solution, comprises distilled water, nonionic surfactant, anionic surfactant and wetting agent.

OTHER I R N, ZENG L, ZHOU J, XU Z, LIN R, WANG C, ZHENG J, HU Y, LIN J, SHEN Q

Composite type dispersant useful for mixed electroplating solution, comprises distilled water, naphtholsulfonic acid condensate salt and strong alkali.

OTHER I R N, ZHOU J, XU Z, LIN R, HU Y, LIN J, SHEN Q, ZENG L, WANG C, ZHENG J

Composite dispersant useful in preparing mixed electroplating solution, comprises e.g. distilled water, nonionic surfactants, anionic surfactants and medium dodecylphenol polyoxyethylene ether, alkylphenol polyoxyethylene ether, polyethylene glycol, and fatty acid methyl ester ethoxylate.

OTHER I R N, LIN R, WANG C, HU Y, ZHENG J, LIN J, SHEN Q, ZENG L, ZHOU J, XU Z

Composite dispersant useful in preparing mixed electroplating solution comprises distilled water, Tween composite as nonionic surfactant, hydrocarbyl sulfonate composite as anionic surfactant, and amide composite as wetting agent.

HU Y, WANG C, LIN R, JI S, XU Z, ZHOU J, ZENG L, SHEN Q, LIN J, ZHENG J, OTHER I R N

Composite dispersant useful in mixed electroplating solution, comprises distilled water, polysorbate as non-ionic surfactant and wetting agent containing hydrocarbyl sulfate compounds and hydrocarbyl sulfonate compounds.

JI S, XU Z, ZHOU J, ZENG L, SHEN Q, LIN J, ZHENG J, HU Y, WANG C, LIN R, OTHER I R N

Composite dispersant useful in mixed electroplating solution used as composite electric contact material, comprises distilled water, non-ionic surfactant, anionic surfactant, and wetting agent.

SHEN Q, LIN J, ZHENG J, HU Y, WANG C, LIN R, JI S, XU Z, ZHOU J, ZENG L, OTHER I R N