国家/地区 世界知识产权组织（7）
IPC部 B（7）
IPC大类 B01（7） C01（4） C07（3）
C25（2）
IPC小类 B01J（7）
IPC B01J037/08（7）
发明人 CHEN C（2） SHEEHAN S W（2）
公开年 2021（7）
申请年 2021（4）  2020（3） 
专利权人 AIR HOLDINGS.（2）

Modified copper-zinc-alumina catalyst used in composition for reducing carbon dioxide for preparing liquid product mixture, contains copper, zinc, aluminum, oxygen, elements chosen from cobalt, iron or nickel and optionally elements chosen from e.g. manganese, silver, niobium and zirconium.

SHEEHAN S W, CHEN C, CLOTH T

Catalyst useful for converting hydrogen gas and carbon dioxide into other materials comprises molybdenum, first element including group metal, second element including e.g. sulfur, carbon, and oxygen and optionally least one group IA metals.

SHEEHAN S W, CHEN C, CHEN Q

Catalyst used for ammonia dehydrogenation, comprises support comprising monocrystalline material having hexagonal structure, and catalyst metal supported on support.

JO Y S, CHA J Y, JEONG H S, KIM Y M, SOHN H T, YOON S P, NAM S W, LEE T J, YOON C W, HAN J H, YOUNGSEOKCHO, CHA J, JEONG H, SONHYUNTAE, YOON S, NAM S, TAIKJIN L, YUN C, HAN Z, YOON C, LI Z, SOHN H, JIN R, CAO Y

Electrocatalyst material for electrode used in selective electrochemical reduction of carbon dioxide to carbon monoxide, comprises copper(I) oxide containing antimony.

ZENG J, CHIODONI A M, RINO T

Producing graphene doped with nitrogen and sulfur atoms (N,S- DDG) used for doping graphene oxide with nitrogen and sulfur, involves providing microorganisms of halobacteria class which are strictly anaerobic and sulfite-reducing.

IAKIMOV V

Alkane dehydrogenation catalyst used for producing hydrogen production apparatus, comprises graphene atom vacancy structure, 3-hydrogenated atom vacancy structure and nitrogen-substituted atom vacancy structure.

KUSAKABE K, TAKAI K, NISHIKAWA M, LIU M, KAZUYUKI T A

Catalyst used for producing hydrogen peroxide, comprises carbon-based support, and catalytic moiety containing metal-nitrogen bonding structure, and bonded to carbon-based support.

HYEON T, SUNG Y, SHIN H, LEE B, JUNG E, SHIN H J, LEE B H, CHUNG E Y, LI B