国家/地区 中国（2）
IPC部 C（2）
IPC大类 C01（2）
IPC小类 C01B（2）
IPC C01B032/186（2）
发明人 YU C（2）
公开年 2018（2）
申请年
专利权人 SAURER JIANG.（2）

Auxiliary device for preparing graphene, comprises supporting body, buffer layer which is arranged on upper surface of supporting body, where buffering layer is provided with multiple penetrating buffer layer of hole.

GAO X, FENG Z, YU C, LIU Q, HE Z, ZHOU C, GUO J

Modified chemical vapor deposition for preparing uniform graphene material, involves selecting silicon carbide substrate, cleaning, drying, vacuumizing, turning on microwave power, heating and removing gas adsorbed on surface substrate.

LIU Q, WEI C, HE Z, WANG J, GUO J, ZHOU C, FENG Z, YU C