国家/地区 中国（7）
IPC部 B（7） D（7）
IPC大类 B32（7） D03（7） D06（4）
D02（3）
IPC小类 B32B（7）
IPC B32B009/00（7）
发明人
公开年 2022（5） 2023（2）
申请年 2022（7）
专利权人

Skin-friendly graphene fabric used for making clothes, comprises graphene fabric main body layer, and skin-friendly layer comprising yarn for improving elasticity and absorbing sweat generated by human body, and yarn for bringing cool feeling.

ZHOU Y

Polyamide tufted recyclable yarn useful for preparing automobile carpet comprises modified polyamide fiber including polyamide fiber, lignin-graphene composite, bamboo charcoal powder, kaolin, aqueous polyurethane, cotton fiber and bamboo fiber.

LIU Q, ZHENG W, GUO C, ZHANG H

Breathable temperature-adjusting fabric useful for manufacturing underwear comprises water absorbing layer and temperature adjusting layer of temperature-adjusting fabric are made by changing layers method and inner layer of temperature-adjusting fabric provided with breathable skin-friendly layer.

LIU W, XU Z

Antistatic bedding fabric comprises lining layer and fabric layer, be provided with pure cotton layer between lining layer and fabric layer, be provided with grid layer between pure cotton layer and fabric layer, grid layer It is the grid layer treated with antistatic agent,.

ZHAO Q, LV Y

Anti-aging and sun-graphene composite fiber fabric comprises modified graphene fiber layer prepared by blending modal fiber and fiber blending graphene, and anti-aged gray cloth provided with cloth layer and antiaging layer.

WU D

Sun-shading wearable terylene cloth, has scattering layer set to change double-layer tissue, scattering layer woven by light-shielding wearable yarn, and supporting layer formed by knitting high-strength ventilating yarn.

WANG X, WANG H, SHEN R

Preparation light, thin and wear-resistant high-strength fabric comprises feeding spandex elastic yarn, high-elastic milk yarn and nylon high-elastic yarn into yarn doubling machine, immersing meta-aramid resin polymer solution in precipitation solution, adding soaking auxiliary agent, and drying.

WU K, LIU H, CHEN Y