国家/地区 中国（3）
IPC部 F（3）
IPC大类 F27（3）
IPC小类 F27B（3）
IPC F27B017/00（3）
发明人
公开年
申请年 2022（2） 
专利权人

High temperature continuous reduction device of graphene oxide film comprises base, where upper end face of base is fixedly connected with supporting columns, which are symmetrically arranged, one end of supporting column far away from base.

LI Z, LIU Z, GAO Y, XIE D, JIANG D, FENG Y, ZHU Y

Sintering processing fixture of sheet graphene heat conducting film, has upper mounting space that is uniformly distributed with upper clapboard, and lower mounting space is distributed with lower clap board.

HUANG Z

Graphene ultra-high temperature resistant curing furnace comprises a bottom plate, where the top outer wall of the bottom plate is provided with a shell, and the top outer wall of the bottom plate is provided with a connecting groove.

ZHANG J