• 文献标题:   Sheet resistance variation of graphene grown on annealed and mechanically polished Cu films
  • 文献类型:   Article
  • 作  者:   LEE JK, PARK CS, KIM H
  • 作者关键词:  
  • 出版物名称:   RSC ADVANCES
  • ISSN:   2046-2069
  • 通讯作者地址:   Inst for Basic Sci Korea
  • 被引频次:   9
  • DOI:   10.1039/c4ra11734d
  • 出版年:   2014

▎ 摘  要

Graphene was grown on a Cu film, processed by annealing and mechanical polishing. The sheet resistance of graphene shows similar to 57% decrease by mechanical polishing for raw Cu and similar to 20% decrease by annealing for 50 nm SiO2 polishing.