• 文献标题:   Electrostatic force microscopy and electrical isolation of etched few-layer graphene nano-domains
  • 文献类型:   Article
  • 作  者:   HUNLEY DP, SUNDARARAJAN A, BOLAND MJ, STRACHAN DR
  • 作者关键词:  
  • 出版物名称:   APPLIED PHYSICS LETTERS
  • ISSN:   0003-6951 EI 1077-3118
  • 通讯作者地址:   Univ Kentucky
  • 被引频次:   2
  • DOI:   10.1063/1.4904709
  • 出版年:   2014

▎ 摘  要

Nanostructured bi-layer graphene samples formed through catalytic etching are investigated with electrostatic force microscopy. The measurements and supporting computations show a variation in the microscopy signal for different nano-domains that are indicative of changes in capacitive coupling related to their small sizes. Abrupt capacitance variations detected across etch tracks indicates that the nano-domains have strong electrical isolation between them. Comparison of the measurements to a resistor-capacitor model indicates that the resistance between two bi-layer graphene regions separated by an approximately 10 nm wide etch track is greater than about 1 x 10(12) Omega with a corresponding gap resistivity greater than about 3 x 10(14) Omega . nm. This extremely large gap resistivity suggests that catalytic etch tracks within few-layer graphene samples are sufficient for providing electrical isolation between separate nano-domains that could permit their use in constructing atomically thin nanogap electrodes, interconnects, and nanoribbons. (C) 2014 AIP Publishing LLC.