• 文献标题:   A review of chemical vapour deposition of graphene on copper
  • 文献类型:   Review
  • 作  者:   MATTEVI C, KIM H, CHHOWALLA M
  • 作者关键词:  
  • 出版物名称:   JOURNAL OF MATERIALS CHEMISTRY
  • ISSN:   0959-9428
  • 通讯作者地址:   Univ London Imperial Coll Sci Technol Med
  • 被引频次:   869
  • DOI:   10.1039/c0jm02126a
  • 出版年:   2011

▎ 摘  要

The discovery of uniform deposition of high-quality single layered graphene on copper has generated significant interest. That interest has been translated into rapid progress in terms of large area deposition of thin films via transfer onto plastic and glass substrates. The opto-electronic properties of the graphene thin films reveal that they are of very high quality with transmittance and conductance values of >90% and 30 Omega/sq, both are comparable to the current state-of-the-art indium tin oxide transparent conductor. In this Feature Article, we provide a detailed and up to date description of the literature on the subject as well as highlighting challenges that must be overcome for the utilization of graphene deposited on copper substrates by chemical vapour deposition.