• 文献标题:   High-performance a MoS2 nanosheet-based nonvolatile memory transistor with a ferroelectric polymer and graphene source-drain electrode
  • 文献类型:   Article
  • 作  者:   LEE YT, HWANG DK, IM S
  • 作者关键词:   mos2, pvdftrfe, ferroelectric fieldeffect transistor fefet
  • 出版物名称:   JOURNAL OF THE KOREAN PHYSICAL SOCIETY
  • ISSN:   0374-4884 EI 1976-8524
  • 通讯作者地址:   Korea Inst Sci Technol
  • 被引频次:   8
  • DOI:   10.3938/jkps.67.1499
  • 出版年:   2015

▎ 摘  要

Two-dimensional (2D) van der Waals (vdWs) materials are a class of new materials due to their unique physical properties. Of the many 2D vdWs materials, molybdenum disulfide (MoS2) is a representative n-type transition-metal dichalcogenide (TMD) semiconductor. Here, we report on a high-performance MoS2 nanosheet-based nonvolatile memory transistor with a poly(vinylidenefluoride-trifluoroethylene) (P(VDF-TrFE)) ferroelectric top gate insulator. In order to enhance the ohmic contact property, we use graphene flakes as source/drain electrodes prepared by using the direct imprinting method with an elastomer stamp. The MoS2 ferroelectric field-effect transistor (FeFET) shows the highest linear electron mobility value of 175 cm(2)/Vs with a high on/off current ratio of more than 10(7), and a very clear memory window of more than 15 V. The program and erase dynamics and the static retention properties are also well demonstrated.