• 文献标题:   Optoelectronic Nonvolatile Memories Using Graphene/Hexagonal Boron Nitride/Rhenium Disulfide Heterostructure
  • 文献类型:   Article
  • 作  者:   JIN JY, ZHU CC, WANG YR, WANG ZP, PENG ZS, PENG K, LIU H, WEI HN, CHU WG, FAN WM, LI YJ, SUN LF
  • 作者关键词:   nonvolatile memory nvm, van der waals heterostructure, multilevel, optoelectronic, rhenium disulfide, top floating gate
  • 出版物名称:   ACS APPLIED ELECTRONIC MATERIALS
  • ISSN:  
  • 通讯作者地址:  
  • 被引频次:   0
  • DOI:   10.1021/acsaelm.2c00409
  • 出版年:   2022

▎ 摘  要

Nonvolatile memories (NVMs) based on van der Waals heterostructure have long attracted attention due to their atomic thinness, low energy consumption, and high performance, making them quite promising devices for next-generation memory. Here, a multilevel optoelectronic NVM based on multilayer disulfide (ReS2) with a top floating gate structure is designed and investigated. This device exhibits extraordinary storage capability with a large storage window ratio (_63%), high on/off ratio (_106), long data retention (>104 s), and excellent cyclic endurance (>1000 W/E cycles). In addition, the device shows a stable optical erasing property under laser illumination, where 13 and 7 discrete currents are clearly observed by applying multiple laser pulses and various laser powers, respectively.