• 文献标题:   Gate-Tunable Resonant Tunneling in Double Bilayer Graphene Heterostructures
  • 文献类型:   Article
  • 作  者:   FALLAHAZAD B, LEE K, KANG S, XUE JM, LARENTIS S, CORBET C, KIM K, MOVVA HCP, TANIGUCHI T, WATANABE K, REGISTER LF, BANERJEE SK, TUTUC E
  • 作者关键词:   bilayer graphene, hexagonal boron nitride, heterostructure, resonant tunneling, negative differential resistance, tunneling fieldeffect transistor
  • 出版物名称:   NANO LETTERS
  • ISSN:   1530-6984 EI 1530-6992
  • 通讯作者地址:   Univ Texas Austin
  • 被引频次:   94
  • DOI:   10.1021/nl503756y
  • 出版年:   2015

▎ 摘  要

We demonstrate gate-tunable resonant tunneling and negative differential resistance in the interlayer currentvoltage characteristics of rotationally aligned double bilayer graphene heterostructures separated by hexagonal boron nitride (hBN) dielectric. An analysis of the heterostructure band alignment using individual layer densities, along with experimentally determined layer chemical potentials indicates that the resonance occurs when the energy bands of the two bilayer graphene are aligned. We discuss the tunneling resistance dependence on the interlayer hBN thickness, as well as the resonance width dependence on mobility and rotational alignment.