• 文献标题:   UV Rewritable Hybrid Graphene/Phosphor p-n Junction Photodiode
  • 文献类型:   Article
  • 作  者:   LI H, SU SB, LIANG CH, ZHANG T, AN XH, HUANG MZ, TAO HH, MA X, NI ZH, TIAN H, CHENT XF
  • 作者关键词:   graphene, photodiode, rewritable, phosphor, photoisomerization
  • 出版物名称:   ACS APPLIED MATERIALS INTERFACES
  • ISSN:   1944-8244 EI 1944-8252
  • 通讯作者地址:   Shanghai Jiao Tong Univ
  • 被引频次:   1
  • DOI:   10.1021/acsami.9b14461
  • 出版年:   2019

▎ 摘  要

Graphene-based p-n junction photodiodes have a potential application prospect in photodetection due to their broadband spectral response, large operating bandwidth, and mechanical flexibility. Here, we report an ultraviolet (UV) rewritable p-n junction photodiode in a configuration of graphene coated with an amorphous phosphor of 4-bromo-1,8-naphthalic anhydride derivative polymer (poly-BrNpA). Under moderate UV irradiation, occurrence of photoisomerization reaction in the poly-BrNpA film leads to its drastically modified optical characteristics and a concurrent n-type doping in the underneath graphene. Meanwhile, the poly-BrNpA film, highly sensitive to water molecules, has a capability of restoring graphene to its initial p-type doping status by means of water adsorption. Based on these findings, a lateral graphene/poly-BrNpA p-n junction photodiode, responsive to visible light at the junction interface, can be written by UV irradiation and then erased via water adsorption. The p-n junction photodiode is rewritable upon such repetitive loops showing repeatable optoelectronic properties. This study provides a new scheme and perspective of making graphene-based rewritable p-n junction photodiodes in a flexible and controllable way, and it may contribute to expanding new families of optoelectronic devices based on two-dimensional materials.