• 文献标题:   Microwave noise characterization of graphene field effect transistors
  • 文献类型:   Article
  • 作  者:   TANZID M, ANDERSSON MA, SUN J, STAKE J
  • 作者关键词:  
  • 出版物名称:   APPLIED PHYSICS LETTERS
  • ISSN:   0003-6951 EI 1077-3118
  • 通讯作者地址:   Chalmers Univ Technol
  • 被引频次:   16
  • DOI:   10.1063/1.4861115
  • 出版年:   2014

▎ 摘  要

The microwave noise parameters of graphene field effect transistors (GFETs) fabricated using chemical vapor deposition graphene with 1 mu m gate length in the 2 to 8 GHz range are reported. The obtained minimum noise temperature (T-min) is 210 to 610 K for the extrinsic device and 100 to 500 K for the intrinsic GFET after de-embedding the parasitic noise contribution. The GFET noise properties are discussed in relation to FET noise models and the channel carrier transport. Comparison shows that GFETs can reach similar noise levels as contemporary Si CMOS technology provided a successful gate length scaling is performed. (C) 2014 Author(s). All article content, except where otherwise noted, is licensed under a Creative Commons Attribution 3.0 Unported License.