• 文献标题:   Ideal Graphene/Silicon Schottky Junction Diodes
  • 文献类型:   Article
  • 作  者:   SINHA D, LEE JU
  • 作者关键词:   graphene, ideal diode, landauer transport formalism, injection rate
  • 出版物名称:   NANO LETTERS
  • ISSN:   1530-6984 EI 1530-6992
  • 通讯作者地址:   SUNY Albany
  • 被引频次:   132
  • DOI:   10.1021/nl501735k
  • 出版年:   2014

▎ 摘  要

The proper understanding of semiconductor devices begins at the metal semiconductor interface. The metal/semiconductor interface itself can also be an important device, as Schottky junctions often forms when the doping in the semiconductors is low. Here, we extend the analysis of metal-silicon Schottky junctions by using graphene, an atomically thin semimetal. We show that a fundamentally new transport model is needed to describe the graphene-silicon Schottky junction. While the current-voltage behavior follows the celebrated ideal diode behavior, the details of the diode characteristics is best characterized by the Landauer transport formalism, suggesting that the injection rate from graphene ultimately determines the transport properties of this new Schottky junction.