▎ 摘　　要

The formation of carbon nanostructures by chemical vapor deposition enhanced by glow-discharge plasma is considered. The studies are conducted in the temperature range 300 to 700A degrees C. Dependences of the structure of the carbon deposit on the thickness of the Ni catalyst film and on the concentration of the carbon-containing component in the vapor phase are analyzed. The reproducible growth of arrays of homogeneous vertical nanotubes or graphene flakes is observed at a low temperature (similar to 350A degrees C). The electrical properties of the structures are studied.