• 文献标题:   The Effect of Thermal and Ultrasonic Treatment on the Formation of Graphene-oxide Nanosheets
  • 文献类型:   Article
  • 作  者:   OH WC, CHEN ML, ZHANG K, ZHANG FJ, JANG WK, ZHANG FJ
  • 作者关键词:   graphene oxide, thermal ultrasonic treatment, tem, raman, afm
  • 出版物名称:   JOURNAL OF THE KOREAN PHYSICAL SOCIETY
  • ISSN:   0374-4884 EI 1976-8524
  • 通讯作者地址:   Hanseo Univ
  • 被引频次:   32
  • DOI:   10.3938/jkps.56.1097
  • 出版年:   2010

▎ 摘  要

Thermal and ultrasonic treatments of grapheme oxide (GO) are proposed to produce graphene-oxide layers. These layers were comprehensively characterized by using X-ray diffraction (XRD), Fourier transform infrared (FT-IR) spectroscopy, scanning electron microscopy (SEM), energy dispersive X-ray (EDX) analysis, transmission electron microscopy (TEM), Raman spectroscopy, and Atomic Force Microscopy (AFM). The XRD patterns of the GO layers produced by using thermal treatment showed a broad peak at around 26.09 degrees, and those of the GO layers produced by using ultrasonic treatment showed a distinct peak at 11.07 degrees. The FT-IR, spectra indicated that the ultrasonic treatments for the sample GO did not change the functional group; however, all oxygen-containing functional groups in the CO layers produced by using thermal treatment were nearly completely removed. The EDX results showed that only 8.6 wt.% oxygen still existed in the sample of CO layers produced by using thermal treatment. From the TEM images, monolayer graphene oxide could be found in a flake form in the GO layers by thermal treatment. The visible D peak, the clear G peak and the characterized 2D band in the Raman spectra indicate the existence of defect-free monolayer and few-layer graphenes. A FM results showed that a single layer of thermally treated grapheme oxide had been produced.